论文标题
通过在20-1000原子量表上重组材料来连续调整折射率：改善反射涂层设计
Continuously tuning the refractive indices by restructuring materials on the 20-1000 atoms scale: improving anti-reflection coating designs
论文作者
论文摘要
我们通过在20-1000个原子量表上构造材料，通过简单的单锅合成来证明块聚合物模板模板在广泛范围内调整功能氧化物的折射率的能力。然后将所述方法与基于遗传算法的优化结合使用，以探索其在反射涂层设计中的应用。合并这些技术可以实现硅的最小两层抗反射堆栈，其宽带反射率仅为38％的宽带反射率，在120°的角跨度上仅3％，并通过制造验证，然后通过光学测量进行验证。
We demonstrate the capability of block-copolymer templating to tune the refractive indices of functional oxides over a broad range by structuring materials on the 20-1000 atoms scale, with simple one-pot synthesis. The presented method is then combined with genetic algorithm-based optimization to explore its application for anti-reflection coating design. Merging these techniques allows for the realization of a minimal two-layer anti-reflection stack for silicon with broadband reflectivity of just 3% from the nominal value of 38%, over a 120° angular span, validated by fabrication followed by optical measurements.
