论文标题
高密度10 kW ECR离子源的等离子体室的设计
Design of a plasma chamber for a high-density 10 kW ECR ion source
论文作者
论文摘要
煤气电子回旋共振离子源以其产生质量较高的低至中等电荷离子束的巨大电流而闻名。这是通过微波加热能力数十亿千瓦来实现的，导致血浆密度高。血浆腔中的平均功率密度可能达到数百个w/cm $^3 $，这给血浆腔室壁带来了很高的热负载。为GISMO GASDANINAG ECRIS开发了水冷的等离子体室，该腔室能够处理10 kW的输入微波功率，平均功率密度在250 W/cm $^3 $中的平均功率密度。血浆室进行了制造并成功测试了200小时。
Gasdynamic electron cyclotron resonance ion sources are known for their ability to produce huge currents of low to moderately charged ion beams with superior quality. This is achieved by means of tens of kW of microwave heating power, leading to high plasma density. Average power density in the plasma chamber may reach hundreds of W/cm$^3$, which poses very high thermal load to plasma chamber walls. A water-cooled plasma chamber has been developed for the GISMO gasdynamic ECRIS, which is able to handle 10 kW of input microwave power with average power density in the plasma of 250 W/cm$^3$. The plasma chamber was manufactured and successfully tested for 200 hours.
